OPTICAL OBJECTIVE CONTROL PECULIARITIES FOR NANOSTRUCTURES FORMATION
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For microelectronics development and obtaining the minimal size of a microchip element at the 10 nm level it is necessary to work out control tools of extended precision. It is shown that the main task to support the production of projection lens elements is creation of control tools for correlation between control and operating wavelengths in a deep vacuum-ultraviolet range. The interferometer for wave aberrations research is described.