KINETICS OF CHEMICAL ETCHING OF PHOTO-THERMO-REFRACTIVE GLASS AND NANOGLASS CERAMICS
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Etching kinetics of initial photo-thermo-refractive glass and nanoglass ceramics in HF solutions at various
concentrations and temperatures has been investigated for the first time. It has been shown that the etching rateof the nanoglass ceramics is ten times higher than of the glass. Future prospects of the PTR glass and chemical etching technology for fabrication of photonics and mechatronics elements have been discussed.