SECTIONING METHOD APPLICATION AT ELLIPSOMETRY OF INHOMOGENEOUS REFLECTION SYSTEMS

A. N. Gorlyak, V. M. Solonukha, I. A. Khramtsovsky


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Abstract

The paper deals with investigation of application peculiarities of ellipsometry methods and UF spectrophotometry at mechanical and chemical processing of optical engineering surface elements made of quartz glass. Ellipsometer LEF–3M–1, spectrophotometer SF–26 and interferometer MII–4 are used as experiment tools; they obtain widely known technical characteristics. Polarization characteristics of reflected light beam were measured by ellipsometry method; spectrophotometry method was used for measuring radiation transmission factor in UF spectrum area; by interference method surface layer thickness at quartz glass etching was measured.
A method for HF–sectioning of inhomogeneous surface layer of polished quartz glass is developed based on ellipsometry equation for reflection system «inhomogeneous layer – inhomogeneous padding». The method makes it possible to carry out the measuring and analysis of optical characteristics for inhomogeneous layers system on inhomogeneous padding and to reconstruct optical profile of surface layers at quartz glass chemical processing.
For definition of refractive index change along the layer depth, approximation of experimental values for polarization characteristics of homogeneous layers system is used. Inhomogeneous surface layer of polished quartz glass consists of an area (with thickness up to 20 nm) and layer refractive index less than refractive index for quartz glass and an area (with thickness up to 0,1 μm) and layer refractive index larger than refractive index for quartz glass. Ellipsometry and photometry methods are used for definition of technological conditions and optical characteristics of inhomogeneous layers at quartz glass chemical processing for optical elements with minimum radiation losses in UF spectrum area.


Keywords: ellipsometry, surface layer, refractive index and layer thickness

References
1.          Zemlyanskii V.S., Gorlyak A.N., Stepanchuk A.A., Khramzovski I.A. Ellipsometricheskii metod tekhnologicheskogo kontrolya elementov lazernoi tekhniki i gradientnoi optiki [Ellipsometry method of technological control of elements of laser equipment and gradient optics]. Scientific and Technical Journal of Information Technologies, Mechanics and Optics, 2007, no. 9 (43), pp. 81–87.
2.          Novikov A.A., Gorlyak A.N., Stepanchuk A.A., Khramzovski I.A. Spektroskopicheskii i ellipsometricheskii metody attestatsii potokov opticheskogo izlucheniya v materiale i poverkhnostnom sloe elementov ionnykh i eksimernykh lazerov [Spectroscopic and ellipsometry methods of certification of optical radiation streams in the material and the surface layer in elements of ion and excimer lasers]. Scientific and Technical Journal of Information Technologies, Mechanics and Optics, 2007, no. 9 (43), pp. 88–96.
3.          Novikov A.A., Prokopenko V.Т., Khramzovski I.A. Opredelenie poter' izlucheniya na opticheskikh elementakh metodami ellipsometrii i spektrofotometrii [Radiation Losses Definition in Optical Elements by Methods of Ellipsometry and Spectrophotometry]. Izv. vuzov. Priborostroenie,2007, vol. 50,no. 3, pp. 62–68.
4.          Aleksandrov M.E., Danilova T.M., Belomutskaya P.S., Khramtsovsky I.A. Opredelenie poter' izlucheniya na opticheskikh elementakh metodom ellipsometrii i impul'snoi fotometrii [Radiation loss determination on the optical elements by ellipsometry and impulse photometry methods]. Scientific and Technical Journal of Information Technologies, Mechanics and Optics, 2011, no. 6 (76), pp. 9–11.
5.          Belomutskaya P.S., Danilova T.M., Khramtsovsky I.A. Opredelenie opticheskikh kharakteristik elementov lazernoi tekhniki metodom vnutrirezonatornykh poter' izlucheniya [Determination of optical characteristics of laser hardware elements by intracavity loss method]. Izv. vuzov. Priborostroenie, 2012, vol. 55, no. 1, pp. 73–78.
6.          Khramtsovsky I.A., Voshchenko T.K., Cherezova L.A., Pshenitsyn V.I., Apinov A.A. Izmenenie opticheskikh svoistv poverkhnostnogo sloya pri ionno-plazmennom raspylenii kvartsevogo stekla [Changes in the optical properties of the surface layer during the ion-plasma sputtering silica]. Optika i spektroskopiya, 1988, vol. 65, no. 1, pp. 141–145.
7.          Zemlyanskii V.S., Khramtsovskii I.A., Stepanchuk A.A., Sychev M.M. Influence of the structure of the surface layer of silica glass on the radiation losses in the UV spectral range. Glass Physics and Chemistry, 2008, vol. 34, no 3, pp. 248–254.
8.          Stepanchuk A.A., Sychev M.M., Prokopenko V.Т., Khramtsovskii I.A. Issledovanie opticheskoi neodnorodnosti fiziko-khimicheskoi struktury parofaznogo stekla [Investigation of the optical inhomogeneity of physico-chemical structure of the glass vapor]. Nerazrushayushchii kontrol' i diagnostika okruzhayushchei sredy, materialov i promyshlennykh izdelii [Proc. Nondestructive testing and diagnostics of the environment, materials and industrial products] / Ed. A.I. Potapov. St. Petersburg, SZTUPubl., 2007, no. 14,pp. 184–193.
9.          Gorlyak A.N., Khramtsovskij I.A. Diagnostics of the physicochemical state of the surface of optoelecronics elements by ellipsometry method. Proc. of 5th Workshop Ellipsometry. Zweibruecken, Germany, 2009, p. 63.
10.       Pshenitsyn V.I., Abaev M.I., Lyzlov N.Yu. Ellipsometriya v fiziko-khimicheskikh issledovaniyakh [Ellipsometry in the physico-chemical studies]. Leningrad, Khimiya Publ., 1986, 152 p.
11.       Pshenitsyn V.I., Mishin A.V., Khramtsovskii I.A., Banshchikov A.G., Kholldarov N.Kh., Tolmachev V.A., Kalinina M.A. Primenenie ellipsometrii i Ozhe-spektroskopii dlya issledovaniya poverkhnosti stekol [Application of ellipsometry and Auger spectroscopy to study the surface of glass]. Elllipsometriya v nauke i tekhnike [Elllipsometriya in science and technology] / Eds. K.K. Svitashev, A.S. Mardezheva. Novosibirsk, IFP SO AN SSSR Publ., 1987, pp. 142–150.
12.       Zemlyanskii V.S., Novikov A.A., Khramtsovskii I.A., Stepanchuk A.A. Osobennosti fiziko-matematicheskogo modelirovaniya struktury neodnorodnykh poverkhnostnykh sloev elementov optoelektroniki [Features of physical and mathematical modeling of heterogeneous structure of the surface layers in optoelectronic components]. Nerazrushayushchii kontrol' i diagnostika okruzhayushchei sredy, materialov i promyshlennykh izdelii [Proc. Nondestructive testing and diagnostics of the environment, materials and industrial products] / Ed. A.I. Potapov. St. Petersburg, SZTUPubl., 2007, no. 14,pp. 207–216.
13.       Zemlyanskii V.S., Khramtsovskii I.A., Gorlyak A.N., Stepanchuk A.A. Methods of ellipsometric analysis of polarization optical properties of inhomogeneous surface layers of optoelectronics elements. Optics and Spectroscopy, 2008, vol. 105, no 2, pp. 320–325. doi: 10.1134/S0030400X08080237
14.       Dagman E.E., Semenenko A.L. Issledovanie neodnorodnykh otrazhayushchikh sistem metodom ellipsometrii. I Aproksimatsiya odnorodnymi sloyami [Investigation of reflecting heterogeneous systems by ellipsometry. I Approximation of homogeneous layers]. Ukrainian Journal of Physics, 1981, vol. 26, no. 5, pp. 820–826.
15.       Dagman E.E., Semenenko A.L. Issledovanie neodnorodnykh otrazhayushchikh sistem metodom ellipsometrii. Algoritmicheskii podkhod. II Approksimatsiya «lineinymi» sloyami [Investigation of reflecting heterogeneous systems by ellipsometry. Algorithmic approach. Approximation II "linear" layers]. Ukrainian Journal of Physics, 1981, vol. 26, no. 6, pp. 922–928.
16.       Pshenitsyn V.I., Khramtsovskii I.A. Novyi podkhod k ellipsometrii real'noi poverkhnosti opticheskikh materialov [New approach to real surface ellipsometry optical materials]. Ellipsometriya: teoriya, metody, prilozhenie [Ellipsometry: theory, methods, application] / Ed. A.V. Rzhanov, L.A. Il'in. Novosibirsk, Nauka Publ., 1987,pp. 8–14.
17.       PshenitsynV.I., KhramtsovskiiI.A., KrylovaN.A., PodsekaevA.V., TurkboevA. Ellipsometriyaotrazhayushcheisistemy"neodnorodnyisloi– neodnorodnayapodlozhka" [Ellipsometryreflectiveofthe"inhomogeneouslayer– inhomogeneoussubstrate"]. Metody prikladnoi matematiki v transportnykh sistemakh[Methods of applied mathematics in transport systems] / Ed. Yu.M. Kulibanov. St. Petersburg, GUVK Publ., 2000, no. 3, pp. 32–37.
18.       Golyak A.N., Cramtsovsky I.A. The ellipcometry of the roug suface on an inhomogeneous substrate. Proc. of 4th International Conference on Spectroscopic Ellipsometry, ICSE 4. Stockholm, Sweden, 2007, Poster Session, p. 74.
19.       Alekseev S.A., Krylova N.A., Mironov A.O., Turkboev A., Khramtsovskii I.A. Primenenie metoda sektsionirovaniya pri kontrole okisnykh pokrytii na ferritakh [Application of the partitioning method in controlling oxide coatings on ferrite]. Voprosy materialovedeniya, 2000, no. 1 (21), pp. 63–65.
20.       Algazin Yu.B., Ioshchenko N.N., Leonenko A.F., Pan'kin V.G., Rykhlitskii S.V., Svitashev K.K. Lazernyi fotoelektricheskii ellipsometr LEF-3M-1 [Laser photoelectric ellipsometer LEF-3M-1]. Pribory i tekhnika eksperimenta,1987,no 6, p. 204.
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