doi: 10.17586/2226-1494-2019-19-5-790-800


STARTING POINT SELECTION IN GROUPING DESIGN METHOD FOR LITHOGRAPHIC OBJECTIVES
 

N. Zoric, I. G. Smirnova, S. Georgiou


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Zoric N.D., Smirnova I.G., Georgiou S. Starting point selection in grouping design method for lithographic objectives. Scientific and Technical Journal of Information Technologies, Mechanics and Optics, 2019, vol. 19, no. 5, pp. 790–800 (in English). doi: 10.17586/2226-1494-2019-19-5-790-800



Abstract
This work aims on method development for obtaining initial designs for ultraviolet (UV) and deep-ultraviolet (DUV) objectives through global search algorithm. We studied a global search based algorithm tending to obtain the feasible local minima of lens design landscape. One of the major challenges of our work is writing macro input related to a number of lenses, the length of objective, and glass material. The obtained results show the main advantages and efficiency of the design approach based on the global search algorithm. As an output, we developed a method and criteria for successful selection of the starting point of micro-lithographic objectives

Keywords: lithography, optical design, projection lens, DUV, UV, global search algorithm, starting point

Acknowledgements. The research leading to these results has received funding from the People Programme (Marie Curie Actions) of the European Union’s Seventh Framework Programme (FP7/2007-2013) under REA grant agreement no. PITN-GA-2013-608082 “ADOPSYS”.

References
1. Bociort F., Van Turnhout M. Looking for order in the optical design landscape. Proceedings of SPIE, 2006, vol. 6288, pp. 628806. doi: 10.1117/12.681541
2. Qin H., Wan Y., Zhang W. Particle swarm optimization for automatic optical design in engineering optics. Jisuan Wuli, Chinese Journal of Computational Physics, 2011, vol. 28, pp. 433–437.
3. Ulrich W., Rostalski H.J., Hudyma R. Development of dioptric projection lenses for deep ultraviolet lithography at Carl Zeiss. Journal of Microlithography, Microfabrication and Microsystems, 2004, vol. 3, no. 1, pp. 87–96. doi: 10.1117/1.1637592
4. Dodoc A., Ulrich W., Feldmann H. Method of manufacturing projection objectives and set of projection objectives manufactured by that method. Patent US 20070013882, 2007.
5. Cao Z., Li Y., Mao Sh. Grouping design method of catadioptric projection objective for deep ultraviolet lithography. Optical Engineering, 2017, vol. 56, no. 2, pp. 025102. doi: 10.1117/1.OE.56.2.025102
6. Zoric N., Livshits I., Dilworth D., Okishev S. Design of an ultraviolet projection lens by using a global search algorithm and computer optimization. Advanced Optical Technologies, 2017, vol. 6, no. 1, pp. 31–38.
doi: 10.1515/aot-2016-0058
7. Dilworth D.C. The Ascendency of Numerical Methods in Lens Design. Journal of Imaging, 2018, vol. 4, no. 12, pp. 137. doi: 10.3390/jimaging4120137
8. Livshits I.L., Sal’nikov A.V., Cho U. Choosing the starting system for designing objectives. Journal of Optical Technology, 2007, vol. 74, no. 11, pp. 783–786. doi: 10.1364/JOT.74.000783
9. Zoric N.D., Livshits I.L., Okishev S.G., Somova E.A.,Anitropov R.V., Letunovskaya M. V. Design method for complex lenses by dividing them into parts. Scientific and Technical Journal of Information Technologies, Mechanics and Optics, 2017, vol. 17, no. 2, pp. 232– 241. (in Russian). doi: 10.17586/2226-1494-2017-17-2-234-241
10. Harriott L.R. Limits of lithography. Proceedings of the IEEE, 2001, vol. 89, no. 3, pp. 366–374. doi: 10.1109/5.915379
1
1. Bentley J., Olson C., Youngworth R.N. In the era of global optimization, the understanding of aberrations remains the key to designing superior optical systems. Proceedings of SPIE, 2010, vol. 7849, pp. 78490C. doi: 10.1117/12.871720
12. Levinson H.J. Principles of Lithography. 2nd ed. Bellingham, WA, SPIE Press, 2005, pp. 33–43.
13. Rothschild M. Projection optical lithography. // Materials Today, 2005, vol. 8, no. 2, pp. 18–24. doi: 10.1016/S1369-7021(05)00698-X
14. Dilworth D.C., Shafer D. Man versus Machine: a Lens Design Challenge. Proceedings of SPIE, 2013, vol. 8841, pp. 88410G. doi: 10.1117/12.2022871
15. Livshits I.L., Zoric N. A Concept of Ultraviolet Lithography System and Design of its Rear Part using Artificial Intelligence for Starting Design. Proc. 4th International Conference on Photonics, Optics and Laser Technology, 2016, pp. 82–86. doi: 10.5220/0005688500820086
16. Hooker J.N., Cagan J., Grossman I.E. Combining artificial intelligence and optimization in engineering design. Carnegie Mellon University, Tepper School of Business, 1994, pp. 11–12.
17. Livshits I.L., Bronchtein I.G., Vasiliev V.N. Information technologies in CAD system for lens design. Proceedings of SPIE, 2009, vol. 7506, pp. 75060C. doi: 10.1117/12.837544
18. Thibault S., Gauvin J., Doucet M., Wang M. Enhanced optical design by distortion control. Proceedings of SPIE, 2005, vol. 5962, pp. 596211. doi: 10.1117/12.625151
19. Mack C. Fundamental Principles of Optical Lithography: The Science of Microfabrication. New York: John Wiley and Sons, 2007. P. 190–194. doi: 10.1002/9780470723876


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