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Editor-in-Chief
Nikiforov
Vladimir O.
D.Sc., Prof.
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doi: 0.17586/2226-1494-2019-19-6-1022-1030
OPTIMIZATION TECHNIQUES APPLIED TO INITIAL DESIGNS OF ULTRAVIOLET LITHOGRAPHIC OBJECTIVE
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Article in English
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Abstract
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Zoric N.D., Thomas L., Smirnova I.G. Optimization techniques applied to initial designs of ultraviolet lithographic objectives. Scientific and Technical Journal of Information Technologies, Mechanics and Optics, 2019, vol. 19, no. 6, pp. 1022–1030 (in English). doi: 10.17586/2226-1494-2019-19-6-1022-1030
Abstract
The optimization of lithographic objectives is a quite challenging task due to many conflicting constraints, limitations and numerous variables. We describe the optimization techniques of starting designs for ultraviolet objectives which were previously generated by the global search algorithm. The powerful tools for the global optimization as Automatic Element Insert feature and Saddle points construction were applied to starting points, examining the applicability limited by design considerations. The ray tracing failures and critical lenses in starting designs caused by automatic decisions of the global search algorithm are fixed and replaced by Saddle point construction. The results of this work and presented techniques of the global optimization are valid and relevant for any on-axis complex optical system.
Keywords: global optimization, automated lens design, lithography, UV, global search algorithm, starting point
Acknowledgements. The research leading to these results has received funding from the People Programme (Marie Curie Actions) of the European Union’s Seventh Framework Programme (FP7/2007-2013) under REA grant agreement No. PITN-GA-2013-608082 “ADOPSYS”. The authors gratefully acknowledge the contributions of Mr. Hou Zhe from the Technical University of Delft.
References
Acknowledgements. The research leading to these results has received funding from the People Programme (Marie Curie Actions) of the European Union’s Seventh Framework Programme (FP7/2007-2013) under REA grant agreement No. PITN-GA-2013-608082 “ADOPSYS”. The authors gratefully acknowledge the contributions of Mr. Hou Zhe from the Technical University of Delft.
References
- Dilworth D.C. Novel global optimization algorithms: binary construction and the saddle-point method. Proceedings of SPIE, 2012, vol. 8486, pp. 84860A. doi: 10.1117/12.929156
- Zoric N.D., Smirnova I.G., Georgiou S. Starting point selection in grouping design method for lithographic objectives. Scientific and Technical Journal of Information Technologies, Mechanics and Optics, 2019, vol. 19. no. 5, pp. 790–800. doi: 10.17586/2226-1494-2019-19-5-790-800
- Bociort F., Marinescu O. Designing lithographic objectives by constructing saddle points. Proc. International Optical Design Conference (IODC 20016), Technical Digest (CD) (Optical Society of America, 2006), 2006, pp. TuA3.
- Cao Z., Li Y., Mao Sh. Grouping design method of catadioptric projection objective for deep ultraviolet lithography. Optical Engineering, 2017, vol. 56, no 2, pp. 025102. doi: 10.1117/1.OE.56.2.025102
- Cheng X., Wang Y., Hao Q., Sasian J. Automatic element addition and deletion in lens optimization. Applied Optics, 2003, vol. 42, no. 7, pp. 1309–1317. doi: 10.1364/AO.42.001309
- Sasian J.M., Descour M.R. Power distribution and symmetry in lens systems. Optical Engineering, 1998, vol. 37, no. 3, pp. 1001–1004. doi: 10.1117/1.601933
- Bociort F., Van Turnhout M. Finding new local minima in lens design landscapes by constructing saddle points. Optical Engineering, 2009, vol. 48, no. 6, pp. 063001. doi: 10.1117/1.3156022
- Zoric N., Livshits I., Dilworth D., Okishev S. Design of an ultraviolet projection lens by using a global search algorithm and computer optimization. Advanced Optical Technologies, 2017, vol. 6, no. 1, pp. 31–38.doi: 10.1515/aot-2016-0058
- Harriott L.R. Limits of lithography. Proceedings of the IEEE, 2001, vol. 89, no. 3, pp. 366–374. doi: 10.1109/5.915379
- Levinson H.J. Principles of lithography. 2nd ed. Bellingham, WA, SPIE Press, 2005, pp. 33–43.
- Shafer D. The consequences of Petzval correction in lithographic designs. Advanced Optical Technologies, 2015, vol. 4, no. 1, pp. 93–97. doi: 10.1515/aot-2014-0067
- Bentley J.L., Olson C., Youngworth R.N. In the era of global optimization, the understanding of aberrations remains the key to designing superior optical systems. Proceedings of SPIE, 2010, vol. 7849, pp. 78490C. doi: 10.1117/12.871720
- Hooker J.N., Cagan J., Grossman I.E. Combining artificial intelligence and optimization in engineering design. Carnegie Mellon University, Tepper School of Business, 1994, pp. 11–12.
- Born M.,Wolf E. Principles of optics: Electromagnetic theory of propagation, interference and diffraction of light. 7th ed. Cambridge, New York, Cambridge University Press, 1999, pp. 190–194.
- Ulrich W., Beiersdöerfer S., Mann H.J. Trends in optical design of projection lenses for UV- and EUV-lithography. Proceedings of SPIE, 2000, vol. 4146, pp. 13–24. doi: 10.1117/12.406667